Time-Efficient High-Resolution Large-Area Nano-Patterning of Silicon Dioxide
A nano-patterning approach on silicon dioxide (SiO2) material, which could be used for the selective growth of III-V nanowires in photovoltaic applications, is demonstrated.In this process, a silicon (Si) stamp with Gun Oil nanopillar structures was first fabricated using electron-beam lithography (EBL) followed by a dry etching process.Afterwards,